TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...
To build optoelectronic circuits, researchers need to make films of semiconductor nanocrystals in desired patterns, just as they can with conventional silicon-based electronics. But the techniques ...
The ability to create intricate, nano-scale patterns is at the heart of nanotechnology, and lithography techniques are the tools that make this possible. From photolithography to FIB, each technique ...
The development of nanoelectronics has enabled operations at the nanoscale, resulting in the creation of smaller and more efficient electronic devices. Here, we offer a comprehensive summary of the ...
High NA EUV is the next step in smaller transistors. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The ...
What Is Electron Beam Lithography? Electron beam lithography (EBL) is a technique for creating high-resolution patterns on a semiconductor substrate by directing a beam of electrons to selectively ...
Lithography, the ability to print patterns onto certain materials using light, is one of the enabling technologies of our age. The size of the features that can be defined this way are tiny, limited ...
Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at IMEC; Harry Levinson, senior fellow and ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback