Plasma etching is a cornerstone technique in semiconductor fabrication, enabling the precise removal of material layers through the use of ionised gases. This process is essential for fabricating ...

The fundamentals of a good Bosch etching system are described below; There are a number of significant features of the equipment used for Bosch processing which differ from normal ICP systems: In ...

In dry etching, the trajectory of accelerated ions is non-uniform and non-vertical, due to collisions with gas molecules and other random thermal effects (figure 1). This has an impact on etch results ...