MILPITAS, Calif., July 20, 2020 /PRNewswire/ -- Today KLA Corporation (NASDAQ: KLAC) announced the revolutionary eSL10™ e-beam patterned-wafer defect inspection system. The new system is designed to ...

Whether the discussion is about smart manufacturing or digital transformation, one of the biggest conversations in the semiconductor industry today centers on the tremendous amount of data fabs ...

What if manufacturing companies could pinpoint the exact cause of a defect the moment it occurs, preventing costly production delays and ensuring top-notch quality? Generative artificial intelligence ...

Several vendors are rolling out next-generation inspection systems and software that locates problematic defects in chips caused by processes in extreme ultraviolet (EUV) lithography. Each defect ...

Researchers built an AI system that adapts to process changes, maintaining defect detection accuracy and lowering retraining costs in smart factories. (Nanowerk News) Artificial intelligence is ...

Designed to provide faster access to 3-D defect data and images, a new solution from FEI and PDF Solutions integrates PDF's Characterization Vehicle (CV) infrastructure and FEI's Defect Analyzer 300HP ...

KLA has announced the launch of four new products for automotive chip manufacturing: the 8935 high productivity patterned wafer inspection system, the C205 broadband plasma patterned wafer inspection ...