Building the world’s smallest reed relay isn’t just a design exercise, it’s a test of how well a supply chain can repeat precision at scale.

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

Increased storage needs at the edge and in the cloud are fueling rising demand for higher-capacity flash memory across multiple applications. Released every 12 to 18 months, 3D NAND scaling outpaces ...

The global Etching Process Parts Market is entering a decade of accelerated expansion as semiconductor manufacturers scale capacity, adopt next-generation process nodes, and intensify requirements for ...

Rembrandt van Rijn (Dutch, 1606–1669) Self-Portrait, Wearing a Flat Cap, c. 1642 Etching, state 1(3) Plate: 3 11/16 x 2 7/16 in. (9.4 x 6.2 cm) Rembrandt House Museum, Amsterdam, 15 B26, NHD 210 An ...

Trymax Semiconductor B.V. provides plasma-based etching, stripping, and curing process equipment for advanced semiconductor packaging, targeting applications in dry descum, ashing, surface preparation ...

In the automotive world, energy is the engine of change. From electric vehicles to hydrogen fuel cell trucks, from early autonomous taxis to the infrastructure that supports them, tomorrow’s mobility ...

Driven by the growing demands of artificial intelligence (AI) and hyperscalers, advanced process technologies are accelerating innovation cycles. The supply chain indicates that in 2025, the advanced ...

The process comprises a surface nitrogenation step via N + ion bombardment, followed by O 2 plasma treatment to form volatile etching byproducts. This approach enables subatomic-level etching ...

Notably, these properties can be maintained even at the atomic scale. Meanwhile, these properties also pose challenges in achieving highly precise and smooth etching of HFO2 films. Now, a group of ...